NanoSeeX Inc.
Update：2026/08/06
Industries
Main Industry
Manufacturing
Main Product/Service
NanoSeeX Service Solutions
Tailored Packages to Fit Your Unique Needs
At NanoSeeX, providing exceptional customer support goes beyond merely responding to service requests quickly. We strive to exceed expectations by offering a comprehensive range of serv
Tailored Packages to Fit Your Unique Needs
At NanoSeeX, providing exceptional customer support goes beyond merely responding to service requests quickly. We strive to exceed expectations by offering a comprehensive range of serv
Founded Year
2023
Unified Business No.
94118256
Status
Active
Number of Employees
10
Total Paid-in
Capital
384,120,000 (NT$)
Location of Company
Taiwan
, Hsinchu County
Information such as company name, company status, responsible person, year of establishment, paid-in capital, and registered address is sourced from the Commercial and Industrial Registration Office of the Ministry of Economic Affairs; listing status includes emerging stock, M&A, and IPO; overseas development is provided by the startup itself.
Notice: This data is compiled from public sources for reference only. We have no direct affiliation with the company and are not their contact person.
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About the Company
Company Profile
Company Description
NanoSeeX develops the first in-line and non-destructive 3D critical dimension(CD) metrology system
Run by a team from ITRI which develops X-ray metrology tool for advanced node monitoring since 2016
Potential applications of the technology：
Advanced 3D Transistor
The team is developing a tool for offering high precision & accuracy measurements of the key 3D CD features such as etch back, inner spacer, STI smiling and multi-thickness processes.
EUV Mask & Pellicle
Interlayer & thickness yeild quality control, and successfully identified EUV reflectivity (EUVR) variations corresponding to a 2% yield difference across different products.
Photonics
Including 3D component structures for leading international AR and VR optical manufacturers
Company Description
NanoSeeX develops the first in-line and non-destructive 3D critical dimension(CD) metrology system
Run by a team from ITRI which develops X-ray metrology tool for advanced node monitoring since 2016
Potential applications of the technology：
Advanced 3D Transistor
The team is developing a tool for offering high precision & accuracy measurements of the key 3D CD features such as etch back, inner spacer, STI smiling and multi-thickness processes.
EUV Mask & Pellicle
Interlayer & thickness yeild quality control, and successfully identified EUV reflectivity (EUVR) variations corresponding to a 2% yield difference across different products.
Photonics
Including 3D component structures for leading international AR and VR optical manufacturers
