NanoSeeX Inc.
Update：2026/11/10
Industries
Main Industry
Manufacturing
Main Product/Service
NanoSeeX Service Solutions
Tailored Packages to Fit Your Unique Needs
At NanoSeeX, providing exceptional customer support goes beyond merely responding to service requests quickly. We strive to exceed expectations by offering a comprehensive range of serv
Tailored Packages to Fit Your Unique Needs
At NanoSeeX, providing exceptional customer support goes beyond merely responding to service requests quickly. We strive to exceed expectations by offering a comprehensive range of serv
The content above was translated by Ai
Founded Year
2023
Unified Business No.
94118256
Status
Active
Number of Employees
10
Total Paid-in
Capital
384,120,000 (NT$)
Location of Company
Taiwan
, Hsinchu County
Company names, registration status, legal representatives, founding years, paid-in capital, registered addresses, and other details are sourced from business registration records maintained by Taiwan’s Administration of Commerce, Ministry of Economic Affairs. Exit status includes Emerging Stock Board listings, M&A, and IPOs. Information on overseas expansion is self-reported by startups.
Note 1: FINDIT compiles company information from public and other sources for reference and does not serve as a point of contact for the companies listed.
Note 2: Some company profiles and product/service descriptions are translated using AI and provided for reference only. In case of discrepancies or ambiguity, the original text prevails.
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About the Company
Company Profile
Company Description
NanoSeeX develops the first in-line and non-destructive 3D critical dimension(CD) metrology system
Run by a team from ITRI which develops X-ray metrology tool for advanced node monitoring since 2016
Potential applications of the technology：
Advanced 3D Transistor
The team is developing a tool for offering high precision & accuracy measurements of the key 3D CD features such as etch back, inner spacer, STI smiling and multi-thickness processes.
EUV Mask & Pellicle
Interlayer & thickness yeild quality control, and successfully identified EUV reflectivity (EUVR) variations corresponding to a 2% yield difference across different products.
Photonics
Including 3D component structures for leading international AR and VR optical manufacturers
Company Description
NanoSeeX develops the first in-line and non-destructive 3D critical dimension(CD) metrology system
Run by a team from ITRI which develops X-ray metrology tool for advanced node monitoring since 2016
Potential applications of the technology：
Advanced 3D Transistor
The team is developing a tool for offering high precision & accuracy measurements of the key 3D CD features such as etch back, inner spacer, STI smiling and multi-thickness processes.
EUV Mask & Pellicle
Interlayer & thickness yeild quality control, and successfully identified EUV reflectivity (EUVR) variations corresponding to a 2% yield difference across different products.
Photonics
Including 3D component structures for leading international AR and VR optical manufacturers
The content above was translated by Ai
