Microluce, Ltd.
Update：2026/09/15
Industries
Main Industry
Manufacturing
Main Product/Service
1. Low-Temperature Epitaxy Technology: This technology utilizes physical sputtering, commonly known as vacuum sputtering. It uses an electric field to dissociate the working gas to generate plasma, which is then accelerated to impact the target material, sputtering the material from the target onto the substrate. Through appropriate technology and equipment, it can produce excellent thin-film chemical reactions and high-quality epitaxial thin films.
2. Self-Compensating Film Thickness Technology: In sputtering epitaxy technology, the sputtering effect generated by the plasma impacting the target material keeps the material ejection angle nearly constant. Therefore, by optimizing parameters such as the working distance, the relative position of the target and substrate, and substrate rotation, a highly uniform thin-film thickness can be achieved across 8 to 12-inch wafer sizes, with a thickness variation of only 1% between the center and the edge of the wafer.
(The content above was translated by AI.)
2. Self-Compensating Film Thickness Technology: In sputtering epitaxy technology, the sputtering effect generated by the plasma impacting the target material keeps the material ejection angle nearly constant. Therefore, by optimizing parameters such as the working distance, the relative position of the target and substrate, and substrate rotation, a highly uniform thin-film thickness can be achieved across 8 to 12-inch wafer sizes, with a thickness variation of only 1% between the center and the edge of the wafer.
(The content above was translated by AI.)
Founded Year
2017
Unified Business No.
69727061
Status
Active
Number of Employees
0
Total Paid-in
Capital
5,000,000 (NT$)
Location of Company
Taiwan
, Hsinchu City
Information such as company name, company status, responsible person, year of establishment, paid-in capital, and registered address is sourced from the Commercial and Industrial Registration Office of the Ministry of Economic Affairs; listing status includes emerging stock, M&A, and IPO; overseas development is provided by the startup itself.
Notice: This data is compiled from public sources for reference only. We have no direct affiliation with the company and are not their contact person.
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About the Company
Microluce, Ltd. was established in October 2017. Supported and founded through the Germination Program of the Ministry of Science and Technology, the company transfers high-end university technologies to the industry. Its technical team consists of faculty and students from the Thin Film Technology Center of National Central University, working alongside senior industry executives to develop sputtering technologies and equipment for producing low-temperature gallium nitride (GaN) epitaxy, with the goal of producing 8 to 12-inch GaN-on-Silicon (GaN-on-Si) epitaxial wafers. Depending on different business models, we can also cooperate with clients on equipment sales and development.
(The content above was translated by AI.)
(The content above was translated by AI.)
